Chapter 395 Enemy against the world

  《The emergence of innovative products in the semiconductor industry》

  《ASML took the lead in developing EUV lithography machine》

  "Chip process may increase tenfold"

  《The chip technology has reached the physical limit》

   While there were still hotspots such as "magic power" and "alien creatures", ASML's EUV lithography machine, under the operation of a group of capital behind it, immediately became a global hotspot.

   Normally speaking, the update and iteration of a product has traces to follow, or there will be technical reserves.

  For example, the EUV lithography machine is obviously a new track, and has little to do with the previous DUV lithography machine, but in the parallel world, it is only after the chip reaches the 7nm bottleneck of the DUV lithography machine limit.

   But here, because of the pressure brought by the Umbrella DUV lithography machine, as well as the prospects of artificial intelligence and quantum computing + supercomputing models are here.

   In order to re-compete for this cutting-edge profit, for a better prospect.

  When the top chip process is still 14nm, ASML launched their EUV lithography machine.

  Because of Umbrella's impact on the lens field, there is also a sense of competition brought about by other technologies.

   The EUV lithography machine that ASML produced in advance this time is even better than the technical parameters originally planned!

  SMC, Four Star, Intel and other fabs have arrived and started assembly and debugging!

  Obviously, ASML’s EUV lithography machine did not mean that it was just manufactured, but it was officially announced after they had already started supplying them and asked them to work overtime to complete the assembly.

   The purpose is to achieve the goal in one step, and to reduce the reaction time for competitors!

  EUV lithography machine is much larger than DUV, weighing 180 tons, and even transportation requires a special vehicle, and it is quite troublesome to assemble.

  If the staff of these cooperative fabs had not been trained in advance, it would be quite normal for the installation and commissioning to start from scratch for more than half a year.

   Now, under the pressure from Umbrella, both ASML and the major fabs have shown their maximum potential, and all of them working overtime have joined forces.

  Under the hype fueled by various capitals, coupled with the multiple new sanctions against Umbrella this time, it also made many people feel relieved.

   This time, I'm afraid the target is Umbrella!

   "What a great deal!"

   "I used to think that the World Company was wronged, but compared to the one against Umbrella, it is terrible!"

   "The World Company was only incidentally affected, and the main target was placed on Umbrella. It is really that their interests are too great."

   "Asmail is so insidious, he has been covering it all the time, and he will come out almost as soon as the final decision is made."

   "..."

  As the discussion on the Internet fermented, when the heat reached its peak, ASML also conducted a live broadcast.

  At the same time, there are many semiconductor engineers such as MCMC, Four Star, Intel, etc., as well as professionals from chip design factories, packaging factories, etc.

   Standing outside a factory building, everyone had smiles on their faces.

  In front of the live broadcast camera, ASML’s engineer took the lead in introducing

   "I'm afraid many people didn't expect that we would give up the original mature DUV technology and develop EUV lithography machine directly from scratch."

   While talking, they walked around the factory building.

"Perhaps from the very beginning, no one was optimistic about the EUV lithography machine, because although it can theoretically achieve ten times the resolution of the DUV lithography machine, it is too difficult, too difficult, and there are too many bottlenecks that need to be broken through. The demand for technology is extremely high, and there are countless difficulties to overcome.”

   While speaking, he also opened the wristband, forming a three-dimensional holographic projection, briefly introducing

"Everyone knows that the essence of a lithography machine is exposure. For a DUV lithography machine, we can still find corresponding lenses to allow deep ultraviolet rays to pass through. Especially the new lenses produced by Umbrella's technology later strengthened this point. Umbrella's own lithography machine took advantage of this corner to overtake, and surpassed our efficiency without using the infiltration method!"

  Asmail did not try to belittle Umbrella, and even bragged beside him.

  Because only when the strength of Umbrella is reflected, can it be shown that they are stronger!

   This is a strong opponent, but still lost, lost in front of us!

"However, this is not true for EUV lithography machines. The 13.5nm wavelength extreme ultraviolet ionization ability we use is extremely strong. There is no lens that can pass this high-energy beam with this precision, so the only option is to reflection!"

   While talking, the holographic image has also been changed, explaining the general principle.

  It is to continuously use the reflection of some lenses to complete the concentration of extreme ultraviolet rays.

   A total of more than a dozen reflections are required to meet the final exposure requirements!

   "The precision requirements for the reflective lens can be said to be extremely high, and I would like to thank Carl Zeiss for its efforts in this regard."

   After speaking, he made a gesture of please to the engineer of Carl Zeiss next to him.

  The engineer from Carl Zeiss also stood up and said politely

   "We also took advantage of Umbrella's technical coating, but of course, in terms of accuracy, we are still a little bit confident..."

   Subsequently, ASML representatives introduced their EUV light source.

"As I said before, extreme ultraviolet rays need to go through more than a dozen reflections to achieve our effect, and because of the ionization consumption of extreme ultraviolet rays, about 30% of the energy will be lost in each reflection, and in the end we can only use about 2% of the light effectively. , Therefore, we need the light source to have sufficient and stable output power. In order to overcome this problem, Cymer has spent a whole decade to overcome it, but Cymer has been acquired by our company three years ago..."

  While talking, he continued to play the holographic screen, and even the principle was revealed in it, that is, to continuously bombard liquid metal droplets with high-energy lasers. Looking at the data he provided makes one's scalp numb due to the difficulty and accuracy.

   It is not difficult to manufacture, but to maintain a stable and durable light source with sufficient output power, it is necessary to ensure that each impact is extremely accurate and the frequency must be high enough.

  Continuously bombarding the falling metal droplets, a slight mistake in all aspects is completely different.

  Following the continuous introduction, the audience also understood how this machine is a monster combined.

Great and beautiful light source technology, neon light source conversion equipment, Gaul valve parts, Prussian lenses, and Swedish bearings all need to be extremely precise and indispensable. Even the installation must be extremely delicate to avoid slight vibrations from the surrounding environment .

  Even the vehicle for transporting the lithography machine is a patented technology of a certain Semiconductor Manufacturing Company!

  The live broadcast is here, and many viewers can see the problem.

  EUV lithography machine is by no means a matter of two technologies, but brings together all the top technologies in the world.

   And these top giants gathered together to suppress Umbrella.

   It is still a way to directly rely on the technical difference and complete the crushing in one go!

   This in itself is also a show of muscle!

   Today, the mainstream chip technology has only reached 14nm.

  However, the theoretical limit of the EUV lithography machine can reach the limit of silicon-based chips, which can reach 1nm!

  If you can solve the tunneling problem, it can even be lower!

  Yes, this is not in line with business laws and profits.

   There is no slow update iteration to harvest.

   But there is no way, Umbrella is too strong to kill, their DUV lithography machine is too good, and the chip is simply in a black box state and completely unclear.

  In this case, they can only take out the best in one breath and knock them down directly.

  Although the chips are overdrawn to the limit, they can make up for it in terms of quantum computing + supercomputing and artificial intelligence!

   No matter how strong Umbrella's artificial intelligence is, it needs to rely on hardware!

  Now, ASML is playing his cards here.

  We have the strongest technologies in the world.

"This is our EUV lithography machine. Although the installation and commissioning have only been completed in major fabs now, how to improve the process to the limit will depend on the means of the major fabs, but our tools have been produced anyway. , already has the conditions to learn from experience through trial and error, and can keep moving forward, keep moving forward...

"Umbrella is very strong, very strong, so strong that it is amazing. The holographic technology I am showing now, the enhanced coating on our lenses, and the structure of artificial intelligence, etc., have established the strength of Umbrella. Base.

   "But, we are stronger..."

   Then the camera zoomed out, and ASML and many companies involved in the design of EUV components, the three major EDA factories, the chip design factory, and all representatives of the wafer factory were all in the same frame.

   Demonstrated their great confidence and strength.

  The reason why this live broadcast is made is to announce to everyone.

  They have mastered the world's top technology.

  The precipitation of this technology is not something you can catch up in a short time!

  You may be able to break through a certain bottleneck in the short term, but you cannot break through all the bottlenecks!

   When you are catching up, we will continue to move forward, always walk in front, build many barriers to block your way, let us always maintain the gap!

   Let us always occupy the biggest profit!

  You, you are against the world...

  ——

   Third watch~First watch~

  

  

  (end of this chapter)